Room temperature gas-solid reaction of titanium on glass surfaces forming a very low resistivity layer

 

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Bibliographische Detailangaben
Autoren: Solís Sánchez, Hugo, Clark Binns, Neville, Azofeifa Alvarado, Daniel E., Avendaño Soto, Esteban
Format: artículo original
Publikationsdatum:2016
Beschreibung:Titanium films were deposited on quartz, glass, polyamide and PET substrates in a high vacuum system at room temperature and their electrical resistance monitored in vacuo as a function of thickness. These measurements indicate that a low electrical resistance layer is formed in a gas-solid reaction during the condensation of the initial layers of Ti on glass and quartz substrates. Layers begin to show relative low electrical resistance at around 21 nm for glass and 9nm for quartz. Samples deposited on polyamide and PET do not show this low resistance feature.
Land:Kérwá
Institution:Universidad de Costa Rica
Repositorio:Kérwá
OAI Identifier:oai:kerwa.ucr.ac.cr:10669/74408
Online Zugang:https://aip.scitation.org/doi/10.1063/1.4963679
https://hdl.handle.net/10669/74408
Access Level:acceso abierto
Stichwort:Electrical resistivity
Quartz
Titanium
Metallic thin films
Thin film growth