Photocatalytic activity of coatings based on titanium oxides deposited by reactive magnetron sputtering method
保存先:
| 著者: | , , |
|---|---|
| フォーマット: | artículo original |
| 状態: | Versión publicada |
| 出版日付: | 2018 |
| その他の書誌記述: | The aim of this project is to measure the photocatalytic activity of titanium oxides thin layers deposited by reactive magnetron sputtering method. The coatings were deposited onto silicon substrates in gas misxture of Ar and O2 and as target was used pure titanium. Chemical composition of coatings was varied by change of O2 flow. As results, it was obtained a chemical composition Ti1-xOx where x is from 0,25 to 0,45. According to the adhesion scratch test, the lowest critical load was 14,43 N and highest was 72,01 N. Results from photocatalytic activity indicates that the samples were not active due to the acid orange in which they were submerge presented no change of color after the UV light exposition. |
| 国: | Portal de Revistas TEC |
| 機関: | Instituto Tecnológico de Costa Rica |
| Repositorio: | Portal de Revistas TEC |
| 言語: | Español |
| OAI Identifier: | oai:ojs.pkp.sfu.ca:article/4083 |
| オンライン･アクセス: | https://revistas.tec.ac.cr/index.php/tec_marcha/article/view/4083 |
| キーワード: | Titanium Oxides, Photocatalytic, Thin Film, Deposition, Sputtering Magnetron. Óxidos de Titanio, Foto catalítico, Capas Delgadas, Deposición, Pulverización Catódica. |