Photocatalytic activity of coatings based on titanium oxides deposited by reactive magnetron sputtering method
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| Nhiều tác giả: | , , |
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| Định dạng: | artículo original |
| Trạng thái: | Versión publicada |
| Ngày xuất bản: | 2018 |
| Miêu tả: | The aim of this project is to measure the photocatalytic activity of titanium oxides thin layers deposited by reactive magnetron sputtering method. The coatings were deposited onto silicon substrates in gas misxture of Ar and O2 and as target was used pure titanium. Chemical composition of coatings was varied by change of O2 flow. As results, it was obtained a chemical composition Ti1-xOx where x is from 0,25 to 0,45. According to the adhesion scratch test, the lowest critical load was 14,43 N and highest was 72,01 N. Results from photocatalytic activity indicates that the samples were not active due to the acid orange in which they were submerge presented no change of color after the UV light exposition. |
| Quốc gia: | Portal de Revistas TEC |
| Tổ chức giáo dục: | Instituto Tecnológico de Costa Rica |
| Repositorio: | Portal de Revistas TEC |
| Ngôn ngữ: | Español |
| OAI Identifier: | oai:ojs.pkp.sfu.ca:article/4083 |
| Truy cập trực tuyến: | https://revistas.tec.ac.cr/index.php/tec_marcha/article/view/4083 |
| Từ khóa: | Titanium Oxides, Photocatalytic, Thin Film, Deposition, Sputtering Magnetron. Óxidos de Titanio, Foto catalítico, Capas Delgadas, Deposición, Pulverización Catódica. |